Corrosion behavior of aluminum doped diamond-like carbon thin films in NaCl aqueous solution.

Investigation of structure, adhesion strength, wear performance and corrosion behavior of platinum/ruthenium/nitrogen doped diamond-like carbon thin films with respect to film thickness

In this study, the corrosion performance of platinum/ruthenium/nitrogen doped diamond-like carbon (PtRuN-DLC) thin films deposited on p-Si substrates using a DCmagnetron sputtering deposition system in a 0.1M NaCl solution was investigated using potentiodynamic polarization test in terms of film thickness. Theeffect of thefilmthickness on the chemical composition, bonding structure, surfacemorp...

Investigation of corrosion behavior of nitrogen doped and platinum/ruthenium doped diamond-like carbon thin films in Hank's solution

Corrosion behavior of nitrogen doped diamond-like carbon thin films in NaCl solutions

Nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films were grown on p-Si(1 1 1) substrates using filtered cathodic vacuum arc (FCVA) deposition by varying nitrogen flow rate. The effect of nitrogen flow rate on the corrosion performance of the films was investigated through potentiodynamic polarization and immersion tests in 0.6 M NaCl solutions. The polarization results showed that t...

Nitrogen-Induced Degradation of Corrosion Resistance of Platinum/Ruthenium/Nitrogen-Doped Diamond-like Carbon Thin Films

An influence of nitrogen incorporation on the chemical composition, bonding structure, surface morphology and activity, adhesion strength, and corrosion resistance of platinum/ruthenium/nitrogen-doped diamond-like carbon PtRuN-DLC thin films deposited on conductive p-Si 100 substrates using dc magnetron sputtering deposition was investigated using X-ray photoelectron spectroscopy, micro-Raman s...

Structure, adhesive strength and electrochemical performance of nitrogen doped diamond-like carbon thin films deposited via DC magnetron sputtering.

Nitrogen doped diamond-like carbon (DLC:N) thin films were deposited on p-Si (100) substrates by DC magnetron sputtering with different nitrogen flow rates at a substrate temperature of about 100 degrees C. The chemical bonding structure of the films was characterized by X-ray photoelectron spectroscopy (XPS) and micro-Raman spectroscopy. The adhesive strength and surface morphology of the film...